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Моделювання процесів фотолітографії на суперкомп’ютері СКІФ К-1000
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UDC: 535.317:004.22
Publication Language: Russian
Stuc. intelekt. 2008; 13(4):348-352
Abstract: The parallel realization of modeling of photolithography processes was developed for application on supercomputer SKIF К-1000. Parallel means of calculation have allowed accelerating of image generation process in a photoresist layer and the subsequent automatic mask inspection.
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